Items where Author is "Lynn, S."

Lynn, S. and Macgearailt, N. and Ringwood, John (2012) Real-time virtual metrology and control of etch rate in an industrial plasma chamber. Proceedings of the IEEE Conference on Control Applications (CAA), Dubrovnik.

Ragnoli, E. and McLoone, Sean F. and Lynn, S. and Ringwood, John and Macgearailt, N. (2009) Identifying key process characteristics and predicting etch rate from High-Dimension Datasets. Advanced Semiconductor Manufacturing Conference, 2009. . viii-ix. ISSN 1078-8743